Company Introduction

Genitech, Inc. was founded in 1996 by the researchers formerly with Electronics & Telecommunications Research Institute (ETRI), located in Daedok Valley, Daejon Korea. The founders of Genitech, Inc. have extensive experiences in semiconductor processes including device designs and equipment. In fact, they did vital roles during the early phases of development of CMOS-technology-based 4M DRAM designs and processes as a government-sponsored project at ETRI, which is recognized to be the major contributing factors to the enormously successful and flourishing DRAM industry today in Korea.

Genitech's primary goal is to develop semiconductor process technologies for the next generation semiconductor manufacturing and beyond.

Genitech's staff members consist of engineers and scientists with Ph.D. and master's degree in physics, chemistry, materials science, electrical engineering, chemical engineering, and mechanical engineering.

Since its inception in 1996, Genitech has been developing advanced technologies in the following three major area.

Plasma enhanced atomic layer deposition (PEALD) tool which solves the limitations of current generation ALD tool. Superfill CVD for Cu interconnection which enables dry process of Cu deposition known to be possible only by wet electroplating. A unique and highly accurate chemical mechanical polishing (CMP) tool, UNIPLA CMP Genitech signed a joint development agreement with ASM International in October 2001.